000 | 00738nam a2200205#a 4500 | ||
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001 | 0000016326 | ||
008 | 211117s2020||||xx |||||||||||||| ||und|| | ||
020 | _a0849335590 | ||
082 | _a621.381528 SIL 2006 | ||
245 | 0 |
_aSilicon heterostructure handbook : materials, fabrication, devices, circuits, and applications of SiGe and Si strained-layer epitaxy _c/ edited by John D. Cressler.. |
|
260 |
_aBoca Raton _bCRC Taylor & Francis _c2006. |
||
300 |
_a1v. (various pagings) _bill. _c26cm |
||
365 | _cMYR | ||
500 | _aIncludes index p.1211 - 1227 | ||
650 |
_aBipolar transistors _xHandbooks, manuals, etc. |
||
650 |
_aSilicon _xHandbooks, manuals, etc. |
||
700 | _aCressler, John D. | ||
942 | _cBK-GN | ||
999 |
_c15550 _d15550 |